MD simulation of chemically enhanced polishing of 6H-SiC in aqueous H2O2
| Autor: | Yang, Shengyao, Li, Xuliang, Zhao, Yitian, Al-amin, Md, Grøndahl, Lisbeth, Lu, Mingyuan, Cheung, Chi Fai, Huang, Han |
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| Zdroj: | In Journal of Manufacturing Processes 1 December 2023 107:515-528 |
| Databáze: | ScienceDirect |
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