Tuning of SiO2/Si interface by a hybrid plasma process combining oxidation and atom-migration
| Autor: | Liang, Shaoxiang, Wu, Bing, Wang, Yinhui, Deng, Hui |
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| Zdroj: | In Journal of Manufacturing Processes 1 December 2023 107:166-178 |
| Databáze: | ScienceDirect |
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