Fabrication of oxide-gate thin-film transistors using PECVD/PLD multichamber system
| Autor: | Matsuki, N, Ohta, J, Fujioka, H, Oshima, M, Yoshimoto, M, Koinuma, H * |
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| Zdroj: | In Science and Technology of Advanced Materials 2000 1(3):187-190 |
| Databáze: | ScienceDirect |
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