Influence of EDTA/THPED Dual-Ligand on Copper Electroless Deposition

Autor: Jianhong, Lu, Yun, Jimmy, Haiping, Lei, Jiguo, Tu, Shu-qiang, Jiao
Zdroj: In International Journal of Electrochemical Science June 2018 13(6):6015-6026
Databáze: ScienceDirect