Impact of plasma reactive ion etching on low dielectric constant porous organosilicate films' microstructure and chemical composition

Autor: Lépinay, Matthieu, Lee, Daniel, Scarazzini, Riccardo, Bardet, Michel, Veillerot, Marc, Broussous, Lucile, Licitra, Christophe, Jousseaume, Vincent, Bertin, François, Rouessac, Vincent, Ayral, André
Zdroj: In Microporous and Mesoporous Materials 1 July 2016 228:297-304
Databáze: ScienceDirect