Optical and electrical properties of nanostructured implanted silicon n+-p junction passivated by atomic layer deposited Al2O3

Autor: Xu, Tao, Tian, Zhenghao, Elmi, Omar Ibrahim, Krzeminski, Christophe, Robbe, Odile, Lambert, Yannick, Yakeda, Dimitri, Okada, Etienne, Wei, Bin, Stiévenard, Didier
Zdroj: In Physica E: Low-dimensional Systems and Nanostructures September 2017 93:190-195
Databáze: ScienceDirect