Exceptionally high-rate production of few-layer MoS2 by a scalable and cost-effective gas-driven shear exfoliation method and its application for supercapacitors

Autor: Zhang, Zhiliang, Liu, Wei, Zhao, Weiling, Xue, Hui, Chen, Zhaoyang, Wang, Dongting, Ji, Jianbing
Zdroj: In Chemical Engineering Journal 1 January 2024 479
Databáze: ScienceDirect