An innovative kinetic model allowing insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine
| Autor: | Topka, Konstantina Christina, Vergnes, Hugues, Tsiros, Tryfon, Papavasileiou, Paris, Decosterd, Laura, Diallo, Babacar, Senocq, François, Samelor, Diane, Pellerin, Nadia, Menu, Marie-Joëlle, Vahlas, Constantin, Caussat, Brigitte |
|---|---|
| Zdroj: | In Chemical Engineering Journal 1 March 2022 431 Part 3 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect