Fluorine-doped graphene oxide prepared by direct plasma treatment for supercapacitor application

Autor:	Sim, Yelyn, Surendran, Subramani, Cha, Hamchorom, Choi, Hyeonuk, Je, Minyeong, Yoo, Seungryul, Chan Seok, Dong, Ho Jung, Yong, Jeon, Cheolho, Jin Kim, Dong, Han, Mi-Kyung, Choi, Heechae, Sim, Uk, Moon, Joonhee
Zdroj:	In Chemical Engineering Journal 15 January 2022 428
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect