Impact of precursor exposure on process efficiency and film properties in spatial atomic layer deposition
| Autor: | Nguyen, Viet Huong, Sekkat, Abderrahime, Jiménez, Carmen, Muñoz, Delfina, Bellet, Daniel, Muñoz-Rojas, David |
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| Zdroj: | In Chemical Engineering Journal 1 January 2021 403 |
| Databáze: | ScienceDirect |
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