The effect of H2–CCl4 mixture plasma treatment on TiO2 photocatalytic oxidation of aromatic air contaminants under both UV and visible light
| Autor: | Hu, Shaozheng, Li, Fayun, Fan, Zhiping, Gui, Jianzhou |
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| Zdroj: | In Chemical Engineering Journal 15 January 2014 236:285-292 |
| Databáze: | ScienceDirect |
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