An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist
| Autor: | Tseng, Ling-Ya, Lin, Yan-Cheng, Kuo, Chih-Cheng, Kuo, Chi-Ching, Ueda, Mitsuru, Chen, Wen-Chang |
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| Zdroj: | In Reactive and Functional Polymers December 2020 157 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect