Mechanistic details of atomic layer deposition (ALD) processes for metal nitride film growth
| Autor: | Tiznado, Hugo, Bouman, Menno, Kang, Byung-Chang, Lee, Ilkeun, Zaera, Francisco |
|---|---|
| Zdroj: | In Journal of Molecular Catalysis. A, Chemical 2008 281(1):35-43 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect