Mechanistic details of atomic layer deposition (ALD) processes for metal nitride film growth
Autor: | Tiznado, Hugo, Bouman, Menno, Kang, Byung-Chang, Lee, Ilkeun, Zaera, Francisco |
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Zdroj: | In Journal of Molecular Catalysis. A, Chemical 2008 281(1):35-43 |
Databáze: | ScienceDirect |
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