Novel CeO2@MOF and its derived abrasives for rapid chemical mechanical polishing
| Autor: | Li, Shaoping, Feng, Kai, Cui, Huidong, He, Zhaobo, Chi, Ruan, Luo, Yue |
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| Zdroj: | In Materials Science in Semiconductor Processing 15 March 2025 188 |
| Databáze: | ScienceDirect |
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