Challenges and solutions in Mist-CVD of Ga2O3 heteroepitaxial films
| Autor: | Vasin, A.V., Yatskiv, R., Černohorský, O., Bašinová, N., Grym, J., Korchovyi, A., Nazarov, A.N., Maixner, J. |
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| Zdroj: | In Materials Science in Semiconductor Processing February 2025 186 |
| Databáze: | ScienceDirect |
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