Enhanced resistance property between ALD-Ru and W by controlling oxygen behavior with post Ru deposition annealing
| Autor: | Kim, Sung Jun, Kim, Seon Yong, Park, Jun Hyeong, Park, In-Sung, Park, Young Wook, Ahn, Jinho |
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| Zdroj: | In Materials Science in Semiconductor Processing January 2025 185 |
| Databáze: | ScienceDirect |
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