Fabrication of TiN metal hard masks via very-high-frequency-direct-current superimposed sputtering
| Autor: | Jeong, Byeong Hwa, Kim, Dong Woo, Yeom, Geun-Young, Kim, Kyong Nam |
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| Zdroj: | In Materials Science in Semiconductor Processing December 2024 184 |
| Databáze: | ScienceDirect |
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