Effect of ternary compound on HfO2-Al2O3 mixture coatings revealed by solid-state NMR and TOF-SIMS
| Autor: | Wen, Jiahui, Ke, Liang, Ren, Jinjun, Shao, Jianda, Zhu, Meiping |
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| Zdroj: | In Materials Science in Semiconductor Processing December 2024 184 |
| Databáze: | ScienceDirect |
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