Selective dry etching of silicon with heat-mode resist GeSb for the preparation of metasurfaces
| Autor: | Zeng, Xu, Zhang, Kui, Wei, Jingsong, Chi, Jiahao, Dai, Haolin, Wang, Yang |
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| Zdroj: | In Materials Science in Semiconductor Processing December 2024 184 |
| Databáze: | ScienceDirect |
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