Tailored electrostatic attraction force between anionic polymer and Si3N4 film in consecutive gate poly open CMP
| Autor: | Choi, Seung-Hoon, Yim, Junhwan, Lim, Jaehyun, Kim, Seji, Jeong, Youncheol, Bae, Kiho, Seo, Jihoon, Lee, Kangchun |
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| Zdroj: | In Materials Science in Semiconductor Processing December 2024 184 |
| Databáze: | ScienceDirect |
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