Effect of grain size on tungsten material removal rate during chemical mechanical planarization process

Autor: Liu, Haoqi, Yang, Tao, Zhang, Yue, Lu, Yihong, Gao, Jianfeng, Li, Junfeng, Luo, Jun
Zdroj: In Materials Science in Semiconductor Processing October 2024 181
Databáze: ScienceDirect