Controlled integration of InP nanoislands with CMOS-compatible Si using nanoheteroepitaxy approach
Autor: | Kamath, Anagha, Ryzhak, Diana, Rodrigues, Adriana, Kafi, Navid, Golz, Christian, Spirito, Davide, Skibitzki, Oliver, Persichetti, Luca, Schmidbauer, Martin, Hatami, Fariba |
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Zdroj: | In Materials Science in Semiconductor Processing 1 November 2024 182 |
Databáze: | ScienceDirect |
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