Controlled integration of InP nanoislands with CMOS-compatible Si using nanoheteroepitaxy approach

Autor: Kamath, Anagha, Ryzhak, Diana, Rodrigues, Adriana, Kafi, Navid, Golz, Christian, Spirito, Davide, Skibitzki, Oliver, Persichetti, Luca, Schmidbauer, Martin, Hatami, Fariba
Zdroj: In Materials Science in Semiconductor Processing 1 November 2024 182
Databáze: ScienceDirect