Achieving equivalent removal of Ta and Ru via controlling oxidation for chemical mechanical polishing of advanced barrier layer
| Autor: | Wu, Yuan, Lei, Rui, Jiang, Liang, Qian, Linmao |
|---|---|
| Zdroj: | In Materials Science in Semiconductor Processing September 2024 180 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect