Al–Ge-paste-induced liquid phase epitaxy of Si-rich SiGe(111) for epitaxial Co-based Heusler alloys
| Autor: | Yamada, Michihiro, Suzuki, Shota, Osaka, Ai I., Sumi, Kazuaki, Inoue, Takahiro, Hattori, Azusa N., Yamada, Shinya, Sawano, Kentarou, Dhamrin, Marwan, Hamaya, Kohei |
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| Zdroj: | In Materials Science in Semiconductor Processing May 2024 174 |
| Databáze: | ScienceDirect |
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