High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch
| Autor: | Shi, Zhitian, Jefimovs, Konstantins, Stampanoni, Marco, Romano, Lucia |
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| Zdroj: | In Materials Science in Semiconductor Processing April 2023 157 |
| Databáze: | ScienceDirect |
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