Thermal activation mechanism of sulfur impurities in sulfur-hyperdoped silicon films
Autor: | Cao, B.Y., Yang, H.W., Chen, Y.J., Lin, Y.B., Yang, Y.J., Wen, C., Yang, W.B. |
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Zdroj: | In Materials Science in Semiconductor Processing December 2022 152 |
Databáze: | ScienceDirect |
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