Thermal characterization and stress analysis of Ho2O3 thin film on 4H–SiC substrate
| Autor: | Odesanya, Kazeem Olabisi, Ahmad, Roslina, Andriyana, Andri, Bingol, Sedat, Çetinkaya, Ridvan, Wong, Yew Hoong |
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| Zdroj: | In Materials Science in Semiconductor Processing December 2022 152 |
| Databáze: | ScienceDirect |
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