Atomic layer etching technique for InAlN/GaN heterostructure with AlN etch-stop layer
| Autor: | Du, Fangzhou, Jiang, Yang, Qiao, Zepeng, Wu, Zhanxia, Tang, Chuying, He, Jiaqi, Zhou, Guangnan, Cheng, Wei-Chih, Tang, Xinyi, Wang, Qing, Yu, Hongyu |
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| Zdroj: | In Materials Science in Semiconductor Processing 1 June 2022 143 |
| Databáze: | ScienceDirect |
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