GaN/InGaN double quantum well (DQW) gate structure for GaN-on-Si based normally-off AlGaN/GaN high electron mobility transistors (HEMTs)

Autor: Biswas, Debaleen, Tsuboi, Takuya, Egawa, Takashi
Zdroj: In Materials Science in Semiconductor Processing 15 November 2021 135
Databáze: ScienceDirect