X-ray diffraction and secondary ion mass spectrometry investigations of GaN films grown on (0 0 1) and (1 1 0) MgF2 substrates by plasma-assisted molecular beam epitaxy (PA-MBE)

Autor: Meyer, Kevin, Buchholz, Martin, Uxa, Daniel, Dörrer, Lars, Schmidt, Harald, Schaadt, Daniel M.
Zdroj: In Materials Science in Semiconductor Processing 15 November 2020 119
Databáze: ScienceDirect