Fundamentals of Ge1−xSnx and SiyGe1−x-ySnx RPCVD epitaxy
Autor: | Margetis, Joe, Mosleh, Aboozar, Ghetmiri, Seyed Amir, Al-Kabi, Sattar, Dou, Wei, Du, Wei, Bhargava, Nupur, Yu, Shui-Qing, Profijt, Harald, Kohen, David, Loo, Roger, Vohra, Anurag, Tolle, John |
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Zdroj: | In Materials Science in Semiconductor Processing 1 November 2017 70:38-43 |
Databáze: | ScienceDirect |
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