Chlorine based focused electron beam induced etching: A novel way to pattern germanium
| Autor: | Shawrav, M.M., Gökdeniz, Z.G., Wanzenboeck, H.D., Taus, P., Mika, J.K., Waid, S., Bertagnolli, E. |
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| Zdroj: | In Materials Science in Semiconductor Processing February 2016 42 Part 2:170-173 |
| Databáze: | ScienceDirect |
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