Damage accumulation during cryogenic and room temperature implantations in strained SiGe alloys
Autor: | Payet, Anthony, Luce, Flavia Piegas, Curfs, Caroline, Mathieu, Benoît, Sklénard, Benoît, Barbé, Jean-Charles, Batude, Perrine, Joblot, Sylvain, Tavernier, Clément, Colombeau, Benjamin, Guissi, Sofiene, Martin-Bragado, Ignacio, Gergaud, Patrice |
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Zdroj: | In Materials Science in Semiconductor Processing February 2016 42 Part 2:247-250 |
Databáze: | ScienceDirect |
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