Annealing effects on electrical and optical properties of a-Si:H layer deposited by PECVD
| Autor: | Elghoul, N., Kraiem, S., Jemai, R., Zebentout, B., Khirouni, K. |
|---|---|
| Zdroj: | In Materials Science in Semiconductor Processing December 2015 40:302-309 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect