Role of Schottky barrier height at source/drain contact for electrical improvement in high carrier concentration amorphous InGaZnO thin film transistors

Autor: Trinh, Thanh Thuy, Jang, Kyungsoo, Velumani, S., Dao, Vinh Ai, Yi, Junsin
Zdroj: In Materials Science in Semiconductor Processing October 2015 38:50-56
Databáze: ScienceDirect