Structural and light emitting properties of silicon-rich silicon nitride films grown by plasma enhanced-chemical vapor deposition

Autor: Torchynska, T.V., Casas Espinola, J.L., Khomenkova, L., Vergara Hernandez, E., Andraca Adame, J.A., Slaoui, A.
Zdroj: In Materials Science in Semiconductor Processing September 2015 37:46-50
Databáze: ScienceDirect