Investigations on phosphorus doped amorphous/nanocrystalline silicon films deposited by a filtered cathodic vacuum arc technique in the presence of hydrogen gas
| Autor: | Kesarwani, A.K., Panwar, O.S., Tripathi, R.K., Dalai, M.K., Chockalingam, Sreekumar |
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| Zdroj: | In Materials Science in Semiconductor Processing March 2015 31:1-9 |
| Databáze: | ScienceDirect |
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