Purification of metallurgical-grade silicon powder via chemical attack by hydrofluoric and nitric acids followed by thermal treatment
Autor: | Khalifa, Marouan, Atyaoui, Malek, Hajji, Messaoud, Ouertani, Rachid, Ezzaouia, Hatem |
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Zdroj: | In Materials Science in Semiconductor Processing December 2013 16(6):1742-1746 |
Databáze: | ScienceDirect |
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