Purification of metallurgical-grade silicon powder via chemical attack by hydrofluoric and nitric acids followed by thermal treatment

Autor: Khalifa, Marouan, Atyaoui, Malek, Hajji, Messaoud, Ouertani, Rachid, Ezzaouia, Hatem
Zdroj: In Materials Science in Semiconductor Processing December 2013 16(6):1742-1746
Databáze: ScienceDirect