A chromium-free etchant for delineation of defects in heavily doped n-type silicon wafers
| Autor: | Zeng, Yuheng, Yang, Deren, Ma, Xiangyang, Zeng, Zhidan, Que, Duanlin, Gong, Longfei, Tian, Daxi, Li, Liben |
|---|---|
| Zdroj: | In Materials Science in Semiconductor Processing 2008 11(4):131-136 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect