On temperature coefficient of resistance of boron-doped SiGe films deposited by sputtering
| Autor: | Jelenkovic, Emil V., Jevtic, Milan M., Tong, K.Y., Pang, G.K.H., Cheung, W.Y., Jha, Shrawan K. |
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| Zdroj: | In Materials Science in Semiconductor Processing 2007 10(4):143-149 |
| Databáze: | ScienceDirect |
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