Characterization of rare earth oxides based MOSFET gate stacks prepared by metal-organic chemical vapour deposition

Autor: Frohlich, K., Luptak, R., Dobrocka, E., Husekova, K., Cico, K., Rosova, A., Lukosius, M., Abrutis, A., Pisecny, P., Espinos, J.P.
Zdroj: In Materials Science in Semiconductor Processing 2006 9(6):1065-1072
Databáze: ScienceDirect