Characterization of rare earth oxides based MOSFET gate stacks prepared by metal-organic chemical vapour deposition
Autor: | Frohlich, K., Luptak, R., Dobrocka, E., Husekova, K., Cico, K., Rosova, A., Lukosius, M., Abrutis, A., Pisecny, P., Espinos, J.P. |
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Zdroj: | In Materials Science in Semiconductor Processing 2006 9(6):1065-1072 |
Databáze: | ScienceDirect |
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