Vacancy-dioxygen centers in Si-rich SiGe alloys

Autor: Khirunenko, L.I., Pomozov, Yu.V., Sosnin, M.G., Trypachko, M.O., Torres, V.J.B., Coutinho, J., Jones, R., Briddon, P.R., Abrosimov, N.V., Riemann, H.
Zdroj: In Materials Science in Semiconductor Processing 2006 9(4):520-524
Databáze: ScienceDirect