Vacancy-dioxygen centers in Si-rich SiGe alloys
Autor: | Khirunenko, L.I., Pomozov, Yu.V., Sosnin, M.G., Trypachko, M.O., Torres, V.J.B., Coutinho, J., Jones, R., Briddon, P.R., Abrosimov, N.V., Riemann, H. |
---|---|
Zdroj: | In Materials Science in Semiconductor Processing 2006 9(4):520-524 |
Databáze: | ScienceDirect |
Externí odkaz: |