Vertical SiGe-based silicon-on-nothing (SON) technology for sub-30 nm MOS devices

Autor: Thompson, Phillip E. *, Jernigan, Glenn, Schulze, Joerg, Eisele, Ignaz, Suligoj, Tomislav
Zdroj: In Materials Science in Semiconductor Processing 2005 8(1):51-57
Databáze: ScienceDirect