Vertical SiGe-based silicon-on-nothing (SON) technology for sub-30 nm MOS devices
Autor: | Thompson, Phillip E. *, Jernigan, Glenn, Schulze, Joerg, Eisele, Ignaz, Suligoj, Tomislav |
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Zdroj: | In Materials Science in Semiconductor Processing 2005 8(1):51-57 |
Databáze: | ScienceDirect |
Externí odkaz: |