Effects of thermal annealing on the structural properties of sputtered W–Si–N diffusion barriers
| Autor: | Vomiero, Alberto *, Boscolo Marchi, Enrico, Frabboni, Stefano, Quaranta, Alberto, Della Mea, Gianantonio, Mariotto, Gino, Felisari, Laura, Butturi, Mariangela |
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| Zdroj: | In Materials Science in Semiconductor Processing 2004 7(4):325-330 |
| Databáze: | ScienceDirect |
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