Modeling rhenium metallization of a silicon-rich (0 0 1) 6H-SiC surface
Autor: | Wiff, D.R. *, Lampert, W.V., Eiting, C.J., McDaniel, G.Y., Glassford, K.M. |
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Zdroj: | In Materials Science in Semiconductor Processing 2005 8(4):497-501 |
Databáze: | ScienceDirect |
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