Residual free reactive ion etching of the Bell contact Ti/Pt/Au
Autor: | Franz, Gerhard *, Kachel, Robert, Sotier, Stefan |
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Zdroj: | In Materials Science in Semiconductor Processing 2002 5(1):45-50 |
Databáze: | ScienceDirect |
Externí odkaz: |
Autor: | Franz, Gerhard *, Kachel, Robert, Sotier, Stefan |
---|---|
Zdroj: | In Materials Science in Semiconductor Processing 2002 5(1):45-50 |
Databáze: | ScienceDirect |
Externí odkaz: |