Matching in-situ and ex-situ recorded stress gradients in an AlxGa1 − xN Heterostructure: Complementary wafer curvature analyses in time and space

Autor: Reisinger, M., Ostermaier, C., Tomberger, M., Zechner, J., Sartory, B., Ecker, W., Daumiller, I., Keckes, J.
Zdroj: In Scripta Materialia 1 April 2018 147:50-54
Databáze: ScienceDirect