On dipping of γ-TiAl in low-concentration phosphoric acid solution and consecutive oxidation resistance at 800 °C
| Autor: | Brou, S.Y., Siab, R., Bonnet, G., Grosseau-Poussard, J.L. |
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| Zdroj: | In Scripta Materialia 2007 56(6):517-520 |
| Databáze: | ScienceDirect |
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