A review on plasma-etch-process induced damage of HgCdTe
| Autor: | Liu, Lingfeng, Chen, Yiyu, Ye, Zhenhua, Ding, Ruijun |
|---|---|
| Zdroj: | In Infrared Physics and Technology May 2018 90:175-185 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Liu, Lingfeng, Chen, Yiyu, Ye, Zhenhua, Ding, Ruijun |
|---|---|
| Zdroj: | In Infrared Physics and Technology May 2018 90:175-185 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect