Effect of post-deposition annealing temperature on RF-sputtered HfO2 thin film for advanced CMOS technology
| Autor: | Khairnar, A.G., Mahajan, A.M. |
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| Zdroj: | In Solid State Sciences January 2013 15:24-28 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Khairnar, A.G., Mahajan, A.M. |
|---|---|
| Zdroj: | In Solid State Sciences January 2013 15:24-28 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect